PECVD

OBJECTIVE: A thin layer with a refractive index lower than that of the silicon wafer itself is deposited on the surface of the diffused silicon wafer to reduce surface reflection when light is incident on the silicon wafer. Therefore, the thin layer is called an anti-reflection film.

Implementation method: a plasma-enhanced chemical vapor deposition technique is used to deposit a silicon nitride anti-reflection film on the surface of the cell sheet, and hydrogenation is also performed at the same time of film formation, so that the solar cell is enhanced while enhancing the absorption of light. Good surface and in vivo passivation while increasing short circuit current and open circuit voltage.